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Denetlenen Tedarikçi | Product: | In2O3/SnO2 90/10wt% / ITO sputtering target |
| Purity: | 99.99% |
| Size: | customized |
| Shape: | Planar and rotary |
| Technology: | Hot press |
| Application: | infrared detectors and magnetic data storage field,etc |
| Packing: | Vacumm sealed, wooden case |
Our factory supply high quality Al2O3, SiO2, Si3N4, SiC, Nb2Ox, TiOx, ITO, AZO sputtering targets, as well as many other compound materials. As ceramic sputtering targets are very fragile with very bad thermal conductivity, so usually it will be bonded with copper backing plate by indium or elastomer, to prolong service time.
Sintering technology are used to produce ceramic sputtering targets, the shape can be round and rectangle.For round target,the diameter can be 1" to 14" , while thickness can be 3mm to 6.35mm, special size can be customized. For rectangle target, monolithic or several tiles construction will be supplied depending on the size.
Features
Chemical Composition: In2O3/SnO2 90/10wt%
Available Purity: 4N
Production Technology: Powder Metallurgy
Shapes: planar targets, rotary targets
Relative density: ≥99.3%
Resistivity: ≤1.8Ω·mm2/m
Deoxygenation Coefficient: ≤0.5%
Available size: round target, diameter ≤ 16", rectangle target, according to your requirement
Indium bonding is recommended for this materials
Advantages: uniform color, smooth surface, no cracks, no chipping, no foreign inclusions and contaminants.
Application: transparent conducting film
OUR ADVANTAGE
Professional and efficient We own a strong teamwork of professional R&D team,
manufacturing team, sales team and after-sales service team.
Provide you 12 hours fastest service.
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